ALD (Atomic Layer Deposition)

  0 /Per Day

Model: SPACE-T (Ultech)

  • Thermal ALD
  • Travelling-wave type Chamber
  • Chamber Temp.: up to 350 ℃
  • Canister Temp.: up to 150℃
  • Wafer size: ≤ 6 inch
  • Thickness Range : 1nm ~
  • Precursor: Zn, Ti / Reactant: O3
Day based pricing : demo3
 0 / days
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